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Solid State Technology: Solid State Technology and SEMI announce the 2014 “Best of West” Award winner
July 9, 2014
Solid State Technology and SEMI, today announced the recipient of the 2014 “Best of West” Award — Nikon Corporation — for its NSR-S630D Immersion Scanner. The award recognizes important product and technology developments in the microelectronics supply chain. [More...]

World’s First Fully Patterned 450mm Wafers Unveiled at SEMICON West
July 8, 2014
Albany, NY – Demonstrating significant progress in the industry transition to 450mm wafer technology, and in support of New York Governor Andrew M. Cuomo’s commitment to New York’s leadership in the development of next generation technologies, the newly merged SUNY College of Nanoscale Science and Engineering (CNSE)/SUNY Institute of Technology (SUNYIT), along with Global 450mm Consortium (G450C) partner Nikon Corporation, today announced the world’s first fully patterned 450mm wafers will be revealed at SEMICON West.

World’s First Nikon 450mm Immersion Lithography Tool Comes Online; Wafer Production Set to Begin This June
April 2, 2014
Governor Andrew M. Cuomo, along with Nikon Corporation, Tokyo Electron, and the SUNY College of Nanoscale Science and Engineering (CNSE) announced today that the world’s first 450mm immersion photolithography tool will begin patterning and delivery of wafers in June of 2014 in support of the Global 450mm Consortium (G450C).

Global 450mm Consortium (G450C) at SUNY's NanoCollege Selects SOKUDO Immersion ArF Lithography Track to Be Added to Dainippon Screen's 450mm Tool Set in New York
February 24, 2014
ALBANY, N.Y. & KYOTO, Japan--(BUSINESS WIRE)--Dainippon Screen Mfg. has confirmed our subsidiary company’s SOKUDO DUO 450mm coat/develop track system has been chosen by the Global 450mm Consortium (G450C), headquartered at the SUNY College of Nanoscale Science and Engineering (CNSE) in Albany, New York, for immersion ArF lithography and Directed Self-Assembly (DSA) applications. [More...]

Business Wire: Gigaphoton Provides G450C with Light Source for Development and Demonstration of HVM 450mm Lithography Process
February 17, 2014
ALBANY, N.Y. & OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc., a major lithography light source manufacturer, announced today that the company’s flagship high-power ArF Immersion Laser (GT64A) will be used by the Global 450 Consortium (G450C), headquartered at SUNY’s College of Nanoscale Science and Engineering (CNSE) in Albany, New York, as the light source for its first 450mm ArF Immersion lithography scanners. [More...]

Yahoo Finance: Gigaphoton Provides G450C with Light Source for Development and Demonstration of HVM 450mm Lithography Process
February 17, 2014
Marking an important step in demonstrating the capability of Gigaphoton’s most advanced high-power GT64A laser for high-volume-production 450mm lithography processe.